The CFM Wafer Washer

The process of cleaning silicon wafers prior to circuit etching for microchips is an arduous and chemically hazardous one conducted in clean room environments. The man / machine interface, where the wafers are loaded and cleaned, and where the process is monitored, is located in an adjacent space. Our industrial design firm interviewed personnel from these environments to better understand workflow processes and clarify user priorities prior to formal industrial design activities.

Imagine
The industrial design of the interface for CFM co-located all of the operator interface functions in the front end of the unit. The system and e-stop controls are designed into the molded polycarbonate control interface module. The industrial design challenge faced by both firms, in addition to applying appropriate human factors measurements, included development of an appearance that supported the $1.5M price of the machine. The rest of the interface is bent, welded, ground and polished stainless steel.

Implement
The Bresslergroup industrial design firm worked closely with the client's fabrication vendors to provide cost effective quality detailing and documentation as well as early production followup.

Impact
The units were so well received that 6 units were sold upon presentation of the first prototype.